Wed, 02/03/2010 - 05:56
Model P400A, Serial Number 22, Build Date 2005
Edward IH 600 vacuum pump
Deposition temperature range 20-600c
Typical Deposition Pressure 1 Torr
Traveling wave reactor, typical flow 1-3 SLM, N2 carrier gas
Round hot wall stainless steel vacuum chamber
Heated by tubular heaters from non-vacuum side
Multiple precursors up to 10 or more able to process at same time
Current processes being run: aluminum oxide (TMA & DI H2O precursor),
silicon oxide with TMA catalysis (TMA & Silanol), titanium oxide (TiCL4 DI H2O)
Have deposited Ta2O5 & ZnO
Reactor Cans & tray assemblies load into the furnace. Cans and trays allow
up to ~20 150mm or 200mm wafers, or ~80 100mm wafers. Trays hold either
one 150 or 200mm wafer per tray or four 100mm wafers per tray.
Capable of processing 300mm wafers with proper setup.
Precursor delivery by raising precursor vapor pressure to low Torr range. Enables
easy cleaning/purging/maintenance than bubblers
Precursors can be solid, liquid or gas.
System controlled by PLC through HMI
Documenation in E-format
Contact: Lerry.Schaftlein@NanoOpto.com, 732-627-0808x2259
Pictures available upon request
